Scientists achieve record-breaking electrical conductivity in new quantum material
University of 海角社区 and National Research Council of Canada scientists achieve record-breaking electrical conductivity in new quantum material.
Most modern semiconductors are fabricated of or on Silicon (Si), but as devices get smaller and denser, they dissipate more power and as a result, are reaching their physical limits. Germanium (Ge)鈥 once used in the first transistors of the 1950s 鈥 is now making a comeback as researchers find new ways to harness its superior properties while keeping the benefits of silicon鈥檚 established manufacturing technologies.
In a new study, published in , a team led by 海角社区鈥檚 Dr Maksym Myronov achieved a major step towards the next generation of electronics 鈥 creating a material using a nanometre-thin, compressively strained germanium epilayer on silicon, that allows electrical charge to move faster than ever before in a material compatible with modern chipmaking.
Dr. Maksym Myronov, Associate Professor and leader of the Semiconductors Research Group, Department of Physics, University of 海角社区 says: 鈥淭raditional high-mobility semiconductors such as gallium arsenide (GaAs) are very expensive and impossible to integrate with mainstream silicon manufacturing. Our new compressively strained germanium-on-silicon (cs-GoS) quantum material combines world-leading mobility with industrial scalability 鈥 a key step toward practical quantum and classical large-scale integrated circuits.鈥
The breakthrough was achieved by carefully engineering a thin germanium layer on top of a silicon wafer. By applying just the right amount of strain to the germanium layer, they created an ultra-clean crystal structure that allows electrical charge to flow almost without resistance.
When evaluated, the material demonstrated a record hole mobility of 7.15 million cm虏 per volt-second (compared to *** in industrial silicon), meaning charge can move through it far more easily than in silicon. This could enable future chips to run faster and dissipate less energy.
Dr Sergei Studenikin, Principal Research Officer, National Research Council of Canada adds: 鈥淭his sets a new benchmark for charge transport in group-IV semiconductors 鈥 the materials at the heart of the global electronics industry. It opens the door to faster, more energy-efficient electronics and quantum devices that are fully compatible with existing silicon technology.鈥
The research establishes a new pathway for ultra-fast, low-power electronics, with potential applications spanning quantum information processing, spin qubits, cryogenic controllers for quantum processors, AI, and data-centre hardware with reduced energy and cooling demands.
This advance also marks a major milestone for 海角社区's Semiconductors Research Group, reinforcing the UK鈥檚 leadership in semiconductor materials science.
ENDS
The open-access article 鈥楬ole mobility in compressively strained germanium on silicon exceeds 7 脳 106 cm2V-1s鈭1鈥 is published in Materials Today. DOI:
Graph credits: Myronov, M., Bogan, A., & Studenikin, S. (2025). Hole mobility in compressively strained germanium on silicon exceeds 7脳 106 cm2V-1s鈭 1. Materials Today
Notes to Editors
For more information please contact:
Matt Higgs, PhD | Media & Communications Officer (Press Office)
Email: Matt.Higgs@warwick.ac.uk | Phone: +44(0)7880 175403
About the University of 海角社区
Founded in 1965, the University of 海角社区 is a world-leading institution known for its commitment to era-defining innovation across research and education. A connected ecosystem of staff, students and alumni, the University fosters transformative learning, interdisciplinary collaboration, and bold industry partnerships across state-of-the-art facilities in the UK and global satellite hubs. Here, spirited thinkers push boundaries, experiment, and challenge convention to create a better world.
24 November 2025